WebJan 15, 2016 · Atomic layer deposition (ALD) has become the method of choice for many applications requiring the controlled growth of thin films on solid surfaces. Yet, the use of metalorganic precursors typical in these depositions adds significant complexity to the chemistry involved. ... trimethylplatinum (MeCpPtMe3) as chemical platinum precursor … WebAs described above, pre-deposition of a metal-oxide film by ALD can lead to enhanced Pt growth by ALD. We were able to reproduce a similar nucleation enhancement as that reported for Al 2 O 3 ALD films with a single AlMe 3 +H 2 O cycle prior to Pt ALD, as shown in Figure 1a and 1b. This result is not unexpected, because by dosing an ALD half ...
Catalytic combustion and dehydrogenation reactions during …
WebJun 2, 2014 · The growth characteristics of Pt deposited by atomic layer deposition (ALD) with methylcyclopentadienyltrimethylplatinum (MeCpPtMe3) and O3 are studied both experimentally and by modeling.... WebOct 4, 2024 · Through adjusting the ALD exposure time of the Pt precursor, the size-controlled Pt catalysts, from Pt single atoms to subclusters and nanoparticles, are prepared on MOF-NC support. X-ray absorption fine structure spectra determine the increased electron vacancy in Pt SACs and indicate the Pt–N coordination in the as-prepared Pt SACs. cpk 求め方 エクセル
Gas-Phase Electron-Impact Activation of Atomic Layer Deposition (ALD …
WebAug 1, 2024 · The use of gas-phase electron-impact activation of metalorganic complexes to facilitate atomic layer depositions (ALD) was tested for the case of … WebGEMStar ALD tool and qualified ozone kit has been studied. Reported herein: growth rate at different temperatures, resistivity at the low temperature of 150 °C and conformality with special ... • All films were deposited on a GEMStar ALD system. MeCpPtMe3 held at 75C TMA precursor held at room temperature, H 2 WebALD Atomic layer deposition MeCpPtMe3 Trimethyl(methylcyclopentadienyl) platinum(IV) DRIFTS Diffuse reflectance infrared Fourier transform spectroscopy ... ALD has been used to produce highly conformal and controllable metal oxide films independent of line of sight. However, unlike the thin-film ALD of ... cpk 求め方 片側